Imaging Localized Energy States in Silicon-doped InGaN Nanowires Using 4D Electron Microscopy

by R. Bose, A. Adhikari, V.M. Burlakov, G. Liu, M.A. Haque, D. Priante, M.N. Hedhili, N. Wehbe, C. Zhao, H. Yang, T.K. Ng, A. Goriely, O.M. Bakr, T. Wu, B.S. Ooi, O.F. Mohammed
Year: 2018 DOI: 10.1021/acsenergylett.7b01330 / ACS Energy Letters, 3, 476–481 (2018)


 ACS Energy Letters, 3, 476–481 (2018)


introducing dopants into InGaN NWs is known to significantly improve their device performances through a variety of mechanisms. However, to further optimize device operation under the influence of large specific surfaces, a thorough knowledge of ultrafast dynamical processes at the surface and interface of these NWs is imperative. Here, we describe the development of four-dimensional scanning ultrafast electron microscopy (4D S-UEM) as an extremely surface-sensitive method to directly visualize in space and time the enormous impact of silicon doping on the surface-carrier dynamics of InGaN NWs. Two time regime dynamics are identified for the first time in a 4D S-UEM experiment: an early time behavior (within 200 picoseconds) associated with the deferred evolution of secondary electrons due to the presence of localized trap states that decrease the electron escape rate and a longer timescale behavior (several ns) marked by accelerated charge carrier recombination. The results are further corroborated by conductivity studies carried out in dark and under illumination.

DOI: 10.1021/acsenergylett.7b01330


Ultrafast electron microscopy Nanowires